Arc energy minimization in high-power impulse magnetron sputtering
Author:
Funder
Russian Science Foundation
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference97 articles.
1. A novel pulsed magnetron sputter technique utilizing very high target power densities;Kouznetsov;Surf. Coating. Technol.,1999
2. Plasma dynamics in a highly ionized pulsed magnetron discharge;Alami1;Plasma Sources Sci. Technol.,2005
3. Ionization of sputtered metals in high power pulsed magnetron sputtering;Bohlmark;J. Vac. Sci. Technol.,2005
4. High power pulsed magnetron sputtered CrNx films;Ehiasarian;Surf. Coating. Technol.,2003
5. Phase tailoring of Ta thin films by highly ionized pulsed magnetron sputtering;Alami;Thin Solid Films,2007
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