Phase tailoring of Ta thin films by highly ionized pulsed magnetron sputtering-Reference-Cited by-同舟云学术

Phase tailoring of Ta thin films by highly ionized pulsed magnetron sputtering

Published:2007-02 Issue:7-8 Volume:515 Page:3434-3438
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Alami J.,Eklund P.,Andersson J.M.,Lattemann M.,Wallin E.,Bohlmark J.,Persson P.,Helmersson U.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference21 articles.

1. M. Winter, WebElements™, the periodic table on the WWW, The University of Sheffield and WebElements Ltd, UK; http://www.webelements.com/; consulted March 01, 2006.

2. Texture and phase transformation of sputter-deposited metastable Ta films and multilayers

3. The relationship between deposition conditions, the beta to alpha phase transformation, and stress relaxation in tantalum thin films

4. Nucleation of body‐centered‐cubic tantalum films with a thin niobium underlayer

5. Low resistivity body‐centered cubic tantalum thin films as diffusion barriers between copper and silicon

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