The relationship between deposition conditions, the beta to alpha phase transformation, and stress relaxation in tantalum thin films
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.352059
Reference11 articles.
1. Ta Film Properties for X-Ray Mask Absorbers
2. Tantalum as a diffusion barrier between copper and silicon
3. Effect of Oxygen Exposure and Deposition Environment on Thermal Stability of Ta Barriers To Cu Penetration.
4. Preparation and properties of tantalum thin films
5. Structural changes of evaporated tantalum during film growth
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