Estimating the Interrelation between the Rate of Atomic Layer Deposition of Thin Platinum-Group Metal Films and the Molecular Mass of Reactant Precursors-Reference-Cited by-同舟云学术

Estimating the Interrelation between the Rate of Atomic Layer Deposition of Thin Platinum-Group Metal Films and the Molecular Mass of Reactant Precursors

Published:2019-07 Issue:4 Volume:48 Page:208-219
ISSN:1063-7397
Container-title:Russian Microelectronics
language:en
Short-container-title:Russ Microelectron

Author:

Vasilyev V. Yu.

Publisher

Pleiades Publishing Ltd

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://link.springer.com/content/pdf/10.1134/S1063739719040103.pdf

Reference46 articles.

1. Xia, L.-Q. and Chang, M., Chemical vapor deposition, in Handbook of Semiconductor Manufacturing Technology, 2nd ed., Doering, R. and Nishi, Y., Boca Raton, FL: CRC, 2008, pp. 13-1–13-87.

2. Vasilyev, V.Yu., Thin Film Chemical Vapor Deposition in Integrated Circuit Technology: Equipment, Methodology and Thin Film Growth Experience, New York: Nova Science, 2014.

3. Ritala, M. and Leskelä, M., in Handbook of Thin Film Materials, Nalwa, H.S., Ed., San Diego: Academic, 2001, vol. 1, pp. 103–159.

4. George, S.M., Atomic layer deposition: an overview, Chem. Rev., 2010, vol. 110, no. 1, pp. 111–131.

5. Hamalainen, J., Ritala, M., and Leskelä, M., Atomic layer deposition of noble metals and their oxides, Chem. Mater., 2014, vol. 26, no. 1, pp. 786–801.

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