Kinetics of the reactions involving CF2 and CF in a pure tetrafluoromethane plasma: I. Production of CF2 and CF via electron-impact dissociation-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Kinetics of the reactions involving CF2 and CF in a pure tetrafluoromethane plasma: I. Production of CF2 and CF via electron-impact dissociation

Published:2002-03 Issue:3 Volume:28 Page:229-242
ISSN:1063-780X
Container-title:Plasma Physics Reports
language:en
Short-container-title:Plasma Phys. Rep.

Author:

Ivanov V. V.,Klopovskii K. S.,Lopaev D. V.,Proshina O. V.,Rakhimov A. T.,Rakhimova T. V.,Rulev G. B.

Publisher

Pleiades Publishing Ltd

Subject

Physics and Astronomy (miscellaneous),Condensed Matter Physics

Link

http://link.springer.com/content/pdf/10.1134/1.1458988.pdf

Reference53 articles.

1. J.-P. Booth, Plasma Sources Sci. Technol. 8, 249 (1999).

2. J.-P. Booth, G. Hancock, N. D. Perry, and M. J. Toogood, J. Appl. Phys. 66, 5251 (1989).

3. S. G. Hansen, G. Luckman, G. C. Nieman, and S. D. Colson, J. Appl. Phys. 68, 2013 (1990).

4. A. D. Tserepi, J. Derouard, J.-P. Booth, and N. Sadeghi, J. Appl. Phys. 81, 2124 (1997).

5. A. D. Tserepi, W. Schwarzenbach, J. Derouard, and N. Sadeghi, J. Vac. Sci. Technol. A 15, 3120 (1997).

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Mechanism of Improving Etching Selectivity for E-Beam Resist AR-N 7520 in the Formation of Photonic Silicon Structures;Processes;2024-09-10

2. Experimental and theoretical study of RF capacitively coupled plasma in Ar–CF4–CF3I mixtures;Plasma Sources Science and Technology;2015-08-18

3. MHD Modeling of the Tip-to-Plane Plasma Arc Behaviour at Very High Pressure in CF4;Plasma Chemistry and Plasma Processing;2014-10-16

4. Experimental study on the formation of higher fluorocarbons from CF4 by a tip–tip electrical arc discharge at very high pressure;Journal of Fluorine Chemistry;2014-10

5. Electron attachment to C2fluorocarbon radicals at high temperature;The Journal of Chemical Physics;2013-11-14

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3