Ideal unreconstructed hydrogen termination of the Si(111) surface obtained by hydrogen exposure of the √3 × √3 -In surface
Author:
Publisher
American Physical Society (APS)
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevB.44.1950/fulltext
Reference20 articles.
1. Chemisorption of atomic hydrogen on the silicon (111) 7 × 7 surface
2. Adsorption states and adsorption kinetics of atomic hydrogen on silicon crystal surfaces
3. Hydrogen Vibration on Si(111) 7 × 7: Evidence for a Unique Chemisorption Site
4. Structure of Si(111)-(7×7)H
5. Realistic tight-binding model for chemisorption: H on Si and Ge (111)
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1. Indium Growth on Reconstructed Si(111)√3 × √3 and 4 × 1 In Surfaces;The Journal of Physical Chemistry C;2010-09-22
2. Electronic structure of hydrogen-terminated silicon surfaces [H-Si(111)] studied by two-photon photoemission;Applied Physics A;2009-12-30
3. Electronic structure ofH/Ge(111)1×1studied by angle-resolved photoelectron spectroscopy;Physical Review B;2009-11-06
4. Core-level photoemission study of thallium adsorbed on aSi(111)−(7×7)surface: Valence state of thallium and the charge state of surface Si atoms;Physical Review B;2006-08-31
5. Photoelectron spectroscopy of atomic core levels on the silicon surface: A review;Technical Physics;2004-10
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