Establishing an accurate depth-scale calibration in the top few nanometers of an ultrashallow implant profile
Author:
Publisher
American Physical Society (APS)
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevB.65.113412/fulltext
Reference6 articles.
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1. Improvement of extra low impact energy SIMS data reduction algorithm for process control;Journal of Vacuum Science & Technology B;2020-09
2. Analytical description of SIMS depth resolution with different ions dose irradiation;AIP Conference Proceedings;2017
3. Application of extra-low impact energy SIMS and data reduction algorithm to USJ profiling;Surface and Interface Analysis;2012-08-05
4. Influence of collisional mixing on mean projected range at high dose irradiation of low-energy ions;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2012-08
5. Advanced SIMS quantification in the first few nm of B, P and As ultrashallow implants;Surface and Interface Analysis;2010-06-08
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