Effects of oxygen impurity on the energy distribution of gap states in hydrogenated amorphous silicon studied by post-transit photocurrent spectroscopy
Author:
Publisher
American Physical Society (APS)
Subject
Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevB.76.075206/fulltext
Reference25 articles.
1. Effect of carbon impurities on the density of states and the stability of hydrogenated amorphous silicon
2. Doping effect of oxygen or nitrogen impurity in hydrogenated amorphous silicon films
3. Influence of oxygen impurity in the intrinsic layer of amorphous silicon solar cells
4. Boron‐compensation effect on hydrogenated amorphous silicon with oxygen and nitrogen impurities
5. Sensitization of the electron lifetime ina-Si:H: The story of oxygen
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2. Modification of the thermal relaxation kinetics of the photoinduced (at T = 425 K) metastable dark conductivity of a-Si:H films by weak illumination during the initial stage of relaxation;Semiconductors;2017-04
3. Light-induced relaxation of the metastable conductivity of undoped a-Si:H films illuminated at elevated temperatures;Semiconductors;2015-05
4. Post-hydrogenation of amorphous hydrogenated silicon films modified by femtosecond laser irradiation;SPIE Proceedings;2014-05-15
5. On the photoinduced effect in undoped a-Si:H films;Semiconductors;2013-06
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