Equilibrium and nonequilibrium hydrogen coverages on vicinal Si(001) surfaces: Diffusion barriers and binding energies
Author:
Publisher
American Physical Society (APS)
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevB.59.2783/fulltext
Reference45 articles.
1. Atomistic Processes in the Early Stages of Thin-Film Growth
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5. Chemical etching of vicinal Si(111): Dependence of the surface structure and the hydrogen termination on the pH of the etching solutions
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