Interface stability of Ti(SiGe)2and SiGe alloys: Tie lines in the ternary equilibrium diagram
Author:
Publisher
American Physical Society (APS)
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevB.53.16279/fulltext
Reference11 articles.
1. High-Speed Silicon-Germanium Electronics
2. Phase transitions during solid‐state formation of cobalt germanide by rapid thermal annealing
3. Stability of C54 titanium germanosilicide on a silicon‐germanium alloy substrate
4. Effect of composition on phase formation and morphology in Ti–Si1−xGex solid phase reactions
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