Surface roughening during plasma-enhanced chemical-vapor deposition of hydrogenated amorphous silicon on crystal silicon substrates
Author:
Publisher
American Physical Society (APS)
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevB.56.4243/fulltext
Reference47 articles.
1. Hydrogenated Amorphous Silicon
2. Film formation mechanisms in the plasma deposition of hydrogenated amorphous silicon
3. Microstructure of plasma‐deposited a‐Si : H films
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