Optical and mass spectrometric investigations of ions and neutral species inSF6radio-frequency discharges
Author:
Publisher
American Physical Society (APS)
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevE.54.1876/fulltext
Reference49 articles.
1. A mechanistic study of SF6 reactive ion etching of tungsten
2. Plasma diagnostics of a SF6radiofrequency discharge used for the etching of silicon
3. Plasma etching of refractory metals (W, Mo, Ta) and silicon in SF6 and SF6-O2. An analysis of the reaction products
4. SF 6, a Preferable Etchant for Plasma Etching Silicon
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