Calculated sheath dynamics under the influence of an asymmetrically pulsed dc bias
Author:
Publisher
American Physical Society (APS)
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevE.66.056401/fulltext
Reference16 articles.
1. Plasma immersion ion implantation for ULSI processing
2. Ion bombardment energy and SiO2/Si fluorocarbon plasma etch selectivity
3. Highly selective SiO2/Si reactive ion beam etching withlow energy fluorocarbon ions
4. Pulse bias sputtering of copper onto insulating surfaces
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