Plasma immersion ion implantation for ULSI processing-Reference-Cited by-同舟云学术

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Plasma immersion ion implantation for ULSI processing

Published:1991-04 Issue:1-4 Volume:55 Page:811-820
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Cheung Nathan W.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference21 articles.

1. Plasma source ion‐implantation technique for surface modification of materials

2. Plasma immersion ion implantation using plasmas generated by radio frequency techniques

3. Model of plasma immersion ion implantation

4. Sheath thickness and potential profiles of ion‐matrix sheaths for cylindrical and spherical electrodes

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