Secondary-ion emission from vanadium as a function of incident ion mass and energy in the range25

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Secondary-ion emission from vanadium as a function of incident ion mass and energy in the range25–275keV

Published:1987-02-01 Issue:4 Volume:35 Page:1485-1491
ISSN:0163-1829
Container-title:Physical Review B
language:en
Short-container-title:Phys. Rev. B

Author:

Blauner Patricia G.,Weller Robert A.

Publisher

American Physical Society (APS)

Link

http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevB.35.1485/fulltext

Reference23 articles.

1. Experimental and theoretical approaches to the ionization process in secondary-ion emission

2. The sputtering process and sputtered ion emission

3. Remarks on Some Factors Influencing the Charge State of Sputtered Particles

4. Mechanisms of atomic ion emission during sputtering

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Multiple-charged secondary-ion emission from silicon and silicon oxide bombarded by heavy ions at energies of 0.4–10 MeV;Physical Review A;1995-01-01

2. Core ionization and ion ejection during SIMS analysis;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1992-02

3. Ion-induced noncollisional ejection of positive secondary ions;Surface Science;1991-12

4. A comparison of ion-induced electron emission and secondary ion yields;Applied Physics A Solids and Surfaces;1991-03

5. Charged and excited states of sputtered atoms;Topics in Applied Physics;1991

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