A comparison of ion-induced electron emission and secondary ion yields-Reference-Cited by-同舟云学术

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A comparison of ion-induced electron emission and secondary ion yields

Published:1991-03 Issue:3 Volume:52 Page:197-202
ISSN:0721-7250
Container-title:Applied Physics A Solids and Surfaces
language:en
Short-container-title:Appl. Phys. A

Author:

Milne R. H.,Maydell E. A.,Fabian D. J.

Publisher

Springer Science and Business Media LLC

Subject

General Materials Science,General Chemistry,Physics and Astronomy (miscellaneous),General Engineering,General Materials Science

Link

http://link.springer.com/content/pdf/10.1007/BF00324418.pdf

Reference27 articles.

1. H.D. Hagstrum: Phys. Rev. 150, 495 (1966);

2. J. Vac. Sci. Technol. 12, 7 (1975)

3. D.J. Fabian: In Soft X-Ray Band Spectra and Electronic Structure, ed. by D.J. Fabian (Academic, New York 1968) p. 215

4. (RBS) L.C. Feldman, J.W. Mayer: Fundamentals of Surface and Thin Film Analysis (Elsevier, Amsterdam 1986)

5. (SIMS) A. Benninghoven, F.G. Rüdenauer, H.W. Werner: Secondary Ion Mass Spectrometry (Wiley, New York 1987)

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1. Depth profiling using secondary ion mass spectrometry and sample current measurements;Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques;2007-12

2. Sputter depth profiling by secondary ion mass spectrometry coupled with sample current measurements;Applied Surface Science;2006-08

3. Ion-excited low-energy Auger electron emission from Ti and TiNi;Journal of Physics: Condensed Matter;1995-07-03

4. Analysis of ion-induced Auger emission: components and their intensities;Surface Science;1994-10

5. Depth profile optimization;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1994-05

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