Particle emission from chemically enhanced electron-beam-induced etching of Si: An approach for zero-energy secondary-ion mass spectrometry
Author:
Publisher
American Physical Society (APS)
Subject
Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevB.79.035305/fulltext
Reference14 articles.
1. Advanced analytical techniques: platform for nano materials science
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3. Focused, Nanoscale Electron-Beam-Induced Deposition and Etching
4. The etching of silicon with XeF2vapor
5. Penetration of fluorine into the silicon lattice during exposure to F atoms, F2, and XeF2: Implications for spontaneous etching reactions
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3. Cryogenic Electron Beam Induced Chemical Etching;ACS Applied Materials & Interfaces;2014-10-23
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