Direct observation of two-dimensional diffusion of the self-interstitials in crystalline Si
Author:
Publisher
American Physical Society (APS)
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevB.66.161310/fulltext
Reference18 articles.
1. Point defects and dopant diffusion in silicon
2. Experiments on atomic-scale mechanisms of diffusion
3. First-Principles Study of Boron Diffusion in Silicon
4. Defects and Diffusion in Silicon Technology
5. B diffusion and clustering in ion implanted Si: The role of B cluster precursors
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