Molecular dynamics studies of ion beam implantation and patterning of silicon: Effect of noble gas cluster formation
Author:
Publisher
American Physical Society (APS)
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevB.97.235443/fulltext
Reference71 articles.
1. Self-organized nanopatterning of silicon surfaces by ion beam sputtering
2. Surface engineering with ion beams: from self-organized nanostructures to ultra-smooth surfaces
3. Linear stability and instability patterns in ion-sputtered silicon
4. Multiple scattering causes the low energy–low angle constant wavelength topographical instability of argon ion bombarded silicon surfaces
5. Theory of ripple topography induced by ion bombardment
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