Atomic and molecular layer deposition: off the beaten track-Reference-Cited by-同舟云学术

Atomic and molecular layer deposition: off the beaten track

Published:2017 Issue:1 Volume:53 Page:45-71
ISSN:1359-7345
Container-title:Chemical Communications
language:en
Short-container-title:Chem. Commun.

Author:

Van Bui H.¹²³⁴,Grillo F.¹²³⁴,van Ommen J. R.¹²³⁴

Affiliation:

1. Chemical Engineering Department

2. Delft University of Technology

3. 2629 HZ Delft

4. The Netherlands

Abstract

ALD archetype and deviations from it.

Funder

European Research Council

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,General Chemistry,Ceramics and Composites,Electronic, Optical and Magnetic Materials,Catalysis

Link

http://pubs.rsc.org/en/content/articlepdf/2017/CC/C6CC05568K

Reference354 articles.

1. Atomic Layer Deposition: An Overview

2. Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process

3. Reactor concepts for atomic layer deposition on agitated particles: A review

4. Island growth as a growth mode in atomic layer deposition: A phenomenological model

5. Island growth in the atomic layer deposition of zirconium oxide and aluminum oxide on hydrogen-terminated silicon: Growth mode modeling and transmission electron microscopy

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