An emission stable vertical air channel diode by a low-cost and IC compatible BOE etching process
Author:
Affiliation:
1. Shanghai Institute of Microsystem and Information Technology
2. Chinese Academy of Sciences
3. Shanghai 200050
4. China
Abstract
An emission-stable nanoscale air channel diode, consisting of two asymmetric flat emitters and a sub-100 nm air channel, is proposed and fabricated by a low-cost and IC compatible BOE Etching Process.
Funder
China Postdoctoral Science Foundation
Publisher
Royal Society of Chemistry (RSC)
Subject
General Materials Science
Link
http://pubs.rsc.org/en/content/articlepdf/2021/NR/D0NR08997D
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