Improvement of the gas cluster ion beam-(GCIB)-based molecular secondary ion mass spectroscopy (SIMS) depth profile with O2+ cosputtering-Reference-Cited by-同舟云学术

Improvement of the gas cluster ion beam-(GCIB)-based molecular secondary ion mass spectroscopy (SIMS) depth profile with O2+ cosputtering

Published:2016 Issue:8 Volume:141 Page:2523-2533
ISSN:0003-2654
Container-title:The Analyst
language:en
Short-container-title:Analyst

Author:

Chu Yi-Hsuan¹²³⁴⁵,Liao Hua-Yang⁵⁶³⁴,Lin Kang-Yi⁵⁶³⁴,Chang Hsun-Yun⁵⁶³⁴,Kao Wei-Lun¹²³⁴⁵,Kuo Ding-Yuan⁵⁶³⁴,You Yun-Wen⁵⁶³⁴,Chu Kuo-Jui¹²³⁴⁵,Wu Chen-Yi¹²³⁴⁵,Shyue Jing-Jong¹²³⁴⁵

Affiliation:

1. Department of Materials Science and Engineering

2. National Taiwan University

3. Taipei

4. Taiwan

5. Research Center for Applied Sciences

6. Academia Sinica

Abstract

The Ar₂₅₀₀⁺ and O₂⁺ cosputter in ToF-SIMS depth profiles retained >95% molecular ion intensity in the steady-state.

Funder

Academia Sinica

Ministry of Science and Technology

Publisher

Royal Society of Chemistry (RSC)

Subject

Electrochemistry,Spectroscopy,Environmental Chemistry,Biochemistry,Analytical Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2016/AN/C5AN02677F

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