Capillary force lithography: the versatility of this facile approach in developing nanoscale applications-Reference-Cited by-同舟云学术

Capillary force lithography: the versatility of this facile approach in developing nanoscale applications

Published:2015 Issue:2 Volume:7 Page:401-414
ISSN:2040-3364
Container-title:Nanoscale
language:en
Short-container-title:Nanoscale

Author:

Ho Dominic¹²³⁴⁵,Zou Jianli⁶⁷⁸⁹,Zdyrko Bogdan¹⁰¹¹¹²,Iyer K. Swaminathan¹²³,Luzinov Igor¹⁰¹¹¹²

Affiliation:

1. School of Chemistry and Biochemistry

2. The University of Western Australia

3. Perth, Australia

4. School of Anatomy

5. Physiology and Human Anatomy

6. Institute for Integrated Cell-Material Sciences (iCeMS)

7. iCeMS Complex 2

8. Kyoto University

9. Kyoto, Japan

10. Department of Materials Science and Engineering

11. Clemson University

12. Clemson, USA

Abstract

Capillary force lithography (CFL) is a facile tool to form sub-100 nm large area patterns from a polymer melt, for applications ranging from surfaces for regulating cell growth to gas sensors.

Funder

National Science Foundation

Australian Research Council

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

Link

http://pubs.rsc.org/en/content/articlepdf/2015/NR/C4NR03565H

Reference100 articles.

1. Capillary Force Lithography

2. Highly Conducting Patterned Pd Nanowires by Direct-Write Electron Beam Lithography

3. Shadow Overlap Ion-beam Lithography for Nanoarchitectures

4. Fabrication of Sub-50-nm Solid-State Nanostructures on the Basis of Dip-Pen Nanolithography

5. New Top-Down Approach for Fabricating High-Aspect-Ratio Complex Nanostructures with 10 nm Scale Features

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