Design of surface patterns with optimized thermodynamic driving forces for the directed self-assembly of block copolymers in lithographic applications-Reference-Cited by-同舟云学术

Design of surface patterns with optimized thermodynamic driving forces for the directed self-assembly of block copolymers in lithographic applications

Published:2017 Issue:5 Volume:2 Page:567-580
ISSN:2058-9689
Container-title:Molecular Systems Design & Engineering
language:en
Short-container-title:Mol. Syst. Des. Eng.

Author:

Garner Grant P.¹²³⁴⁵^ORCID,Rincon Delgadillo Paulina¹²³⁴⁵,Gronheid Roel⁴⁵⁶,Nealey Paul F.¹²³,de Pablo Juan J.¹²³

Affiliation:

1. Institute for Molecular Engineering

2. University of Chicago

3. USA

4. Interuniversity MicroElectronic Center

5. Leuven

6. Belgium

Abstract

A theoretical method for developing design rules for the directed self-assembly of block copolymers for lithographic applications.

Funder

Semiconductor Research Corporation

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,Industrial and Manufacturing Engineering,Process Chemistry and Technology,Energy Engineering and Power Technology,Biomedical Engineering,Chemical Engineering (miscellaneous),Chemistry (miscellaneous)

Link

http://pubs.rsc.org/en/content/articlepdf/2017/ME/C7ME00028F

Reference27 articles.

1. Block Copolymers—Designer Soft Materials

2. Directed Self-Assembly of Block Copolymers for Nanolithography: Fabrication of Isolated Features and Essential Integrated Circuit Geometries

3. Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates

4. Fabrication of Lithographically Defined Chemically Patterned Polymer Brushes and Mats

5. Dense Self-Assembly on Sparse Chemical Patterns: Rectifying and Multiplying Lithographic Patterns Using Block Copolymers

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