High-speed scanning thermal lithography for nanostructuring of electronic devices-Reference-Cited by-同舟云学术

High-speed scanning thermal lithography for nanostructuring of electronic devices

Published:2014 Issue:11 Volume:6 Page:5813-5819
ISSN:2040-3364
Container-title:Nanoscale
language:en
Short-container-title:Nanoscale

Author:

Shaw Joseph E.¹²³,Stavrinou Paul N.¹²³,Anthopoulos Thomas D.¹²³

Affiliation:

1. Department of Physics and Centre for Plastic Electronics Blackett Laboratory

2. Imperial College London

3. , UK

Abstract

A high-speed nanopatterning method is developed for the rapid prototyping of nanostructured active and passive components as well as fully functional organic electronic devices.

Funder

Engineering and Physical Sciences Research Council

European Research Council

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

Link

http://pubs.rsc.org/en/content/articlepdf/2014/NR/C4NR00209A

Reference13 articles.

1. Local wettability modification by thermochemical nanolithography with write-read-overwrite capability

2. Nanoscale Three-Dimensional Patterning of Molecular Resists by Scanning Probes

3. Thermomechanical writing with an atomic force microscope tip

4. High-Speed, Sub-15 nm Feature Size Thermochemical Nanolithography

5. Nanoscale Tunable Reduction of Graphene Oxide for Graphene Electronics

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