A new mechanism for the low dielectric property of POSS nanocomposites: the key role of interfacial effect
Author:
Affiliation:
1. State Key Laboratory Cultivation Base for Nonmetal Composite and Functional Materials
2. Southwest University of Science and Technology
3. Mianyang
4. China
5. School of Materials Science and Engineering
Abstract
The low dielectric constant (ε) of polyhedral oligomeric silsesquioxanes (POSS) nanocomposites was also attributed to its interfacial structure.
Publisher
Royal Society of Chemistry (RSC)
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Link
http://pubs.rsc.org/en/content/articlepdf/2017/CP/C7CP02678A
Reference20 articles.
1. Low Dielectric Constant Materials
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4. Nanoporous Ultra-Low-Dielectric-Constant Fluoropolymer Films via Selective UV Decomposition of Poly(pentafluorostyrene)-block-Poly(methyl methacrylate) Copolymers Prepared Using Atom Transfer Radical Polymerization
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