Organic–inorganic hybrid photoresists containing hexafluoroantimonate: design, synthesis and high resolution EUV lithography studies
Author:
Affiliation:
1. School of Basic Sciences
2. Indian Institute of Technology Mandi
3. India
4. School of Computing and Electrical Engineering
Abstract
New organic–inorganic hybrid photoresists containing inorganic counter-ion motif SbF6− have been developed and successfully tested for patterning high resolution features under EUVL conditions.
Publisher
Royal Society of Chemistry (RSC)
Subject
Materials Chemistry,General Materials Science
Link
http://pubs.rsc.org/en/content/articlepdf/2017/QM/C7QM00343A
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