Organic–inorganic hybrid photoresists containing hexafluoroantimonate: design, synthesis and high resolution EUV lithography studies-Reference-Cited by-同舟云学术

Organic–inorganic hybrid photoresists containing hexafluoroantimonate: design, synthesis and high resolution EUV lithography studies

Published:2017 Issue:12 Volume:1 Page:2613-2619
ISSN:2052-1537
Container-title:Materials Chemistry Frontiers
language:en
Short-container-title:Mater. Chem. Front.

Author:

Guruprasad Reddy Pulikanti¹²³^ORCID,Kumar Pawan⁴²³^ORCID,Ghosh Subrata¹²³^ORCID,Pradeep Chullikkattil P.¹²³^ORCID,Sharma Satinder K.⁴²³^ORCID,Gonsalves Kenneth E.¹²³^ORCID

Affiliation:

1. School of Basic Sciences

2. Indian Institute of Technology Mandi

3. India

4. School of Computing and Electrical Engineering

Abstract

New organic–inorganic hybrid photoresists containing inorganic counter-ion motif SbF₆⁻ have been developed and successfully tested for patterning high resolution features under EUVL conditions.

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Materials Science

Link

http://pubs.rsc.org/en/content/articlepdf/2017/QM/C7QM00343A

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