Mechanistic insights of Sn-based non-chemically-amplified resists under EUV irradiation-Reference-Cited by-同舟云学术

Mechanistic insights of Sn-based non-chemically-amplified resists under EUV irradiation

Published:2020-12 Issue: Volume:533 Page:146553
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Belmonte Guilherme K.,Cendron Suelen W.,Guruprasad Reddy Pulikanti,Moura Cleverson A.S.,Ghulam Moinuddin Mohamad,Peter Jerome,Sharma Satinder K.,Albara Lando Gabriela,Puiatti Marcelo,Gonsalves Kenneth E.,Weibel Daniel E.

Funder

Conselho Nacional de Desenvolvimento Científico e Tecnológico

CAPES

LNLS

CNPq

IIT Mandi

TSG

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

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4. Organic-inorganic hybrid photoresists containing hexafluoroantimonate: design, synthesis and high resolution EUV lithography studies;Reddy;Mater. Chem. Front.,2017

5. EUV Mechanistic Studies of Antimony Resists;Murphy;J. Photopolym. Sci. Technol.,2017

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