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Certified ion implantation fluence by high accuracy RBS

  • Published:2015 Issue:9 Volume:140 Page:3251-3261
  • ISSN:0003-2654
  • Container-title:The Analyst
  • language:en
  • Short-container-title:Analyst

Author:

Colaux Julien L.123,Jeynes Chris123,Heasman Keith C.123,Gwilliam Russell M.123

Affiliation:

1. University of Surrey Ion Beam Centre

2. Guildford GU2 7XH

3. England

Abstract

1% Implanter Performance: RBS/measured fluence ratio for 16 implants (1015 As cm−2) over 2 years.

Publisher

Royal Society of Chemistry (RSC)

Subject

Electrochemistry,Spectroscopy,Environmental Chemistry,Biochemistry,Analytical Chemistry

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