Atomic layer deposited tungsten nitride thin films as a new lithium-ion battery anode-Reference-Cited by-同舟云学术

Atomic layer deposited tungsten nitride thin films as a new lithium-ion battery anode

Published:2015 Issue:26 Volume:17 Page:17445-17453
ISSN:1463-9076
Container-title:Physical Chemistry Chemical Physics
language:en
Short-container-title:Phys. Chem. Chem. Phys.

Author:

Nandi Dip K.¹²³⁴,Sen Uttam K.¹²³⁴,Sinha Soumyadeep¹²³⁴,Dhara Arpan¹²³⁴,Mitra Sagar¹²³⁴,Sarkar Shaibal K.¹²³⁴

Affiliation:

1. Department of Energy Science and Engineering

2. Indian Institute of Technology Bombay

3. Mumbai

4. India

Abstract

Atomic layer deposited WN_x thin films are used as a new Li-ion battery anode whose capacity can be enhanced further by depositing the film on a MWCNT scaffold layer.

Publisher

Royal Society of Chemistry (RSC)

Subject

Physical and Theoretical Chemistry,General Physics and Astronomy

Link

http://pubs.rsc.org/en/content/articlepdf/2015/CP/C5CP02184G

Reference42 articles.

1. Tungsten Nitrido Complexes as Precursors for Low Temperature Chemical Vapor Deposition of WNxCy Films as Diffusion Barriers for Cu Metallization

2. Chemical vapor deposition of WNxCy using the tungsten piperidylhydrazido complex Cl4(CH3CN)W(N-pip): Deposition, characterization, and diffusion barrier evaluation

3. Gate Oxide Reliability Characterization of Tungsten Polymetal Gate with Low-Contact-Resistive WSix/WN Diffusion Barrier in Memory Devices

4. Nucleation and Adhesion of ALD Copper on Cobalt Adhesion Layers and Tungsten Nitride Diffusion Barriers

5. Recent developments in transition metal carbides and nitrides as hydrogen evolution electrocatalysts

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