Chemical vapor deposition of WNxCy using the tungsten piperidylhydrazido complex Cl4(CH3CN)W(N-pip): Deposition, characterization, and diffusion barrier evaluation-Reference-Cited by-同舟云学术

Chemical vapor deposition of WNxCy using the tungsten piperidylhydrazido complex Cl4(CH3CN)W(N-pip): Deposition, characterization, and diffusion barrier evaluation

Published:2009-07 Issue:4 Volume:27 Page:943-950
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Kim Dojun,Kim Oh Hyun,Anderson Tim,Koller Jürgen,McElwee-White Lisa,Leu Lii-Cherng,Tsai Joseph M.,Norton David P.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.3106625

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