Self-assembly morphology of block copolymers in sub-10 nm topographical guiding patterns-Reference-Cited by-同舟云学术

Self-assembly morphology of block copolymers in sub-10 nm topographical guiding patterns

Published:2019 Issue:1 Volume:4 Page:175-185
ISSN:2058-9689
Container-title:Molecular Systems Design & Engineering
language:en
Short-container-title:Mol. Syst. Des. Eng.

Author:

Gottlieb S.¹²³⁴^ORCID,Rösner B.⁵⁶⁷⁸,Evangelio L.¹²³⁴,Fernández-Regúlez M.¹²³⁴,Nogales A.⁹¹⁰⁴^ORCID,García-Gutiérrez M. C.⁹¹⁰⁴^ORCID,Keller T. F.¹¹¹²¹³¹⁴¹⁵^ORCID,Fraxedas J.¹⁶¹⁷¹⁸¹⁹⁴^ORCID,Ezquerra T. A.⁹¹⁰⁴,David C.⁵⁶⁷⁸,Perez-Murano F.¹²³⁴^ORCID

Affiliation:

1. Instituto de Microelectrónica de Barcelona IMB-CNM

2. CSIC

3. Barcelona

4. Spain

5. Laboratory for Micro- and Nanotechnology

6. Paul Scherrer Institut

7. 5232 Villigen-PSI

8. Switzerland

9. Instituto de Estructura de la Materia IEM-CSIC

10. 28006 Madrid

11. Deutsches Elektronen-Synchrotron DESY

12. 22607 Hamburg

13. Germany

14. Fachbereich Physik

15. Universität Hamburg

16. Catalan Institute of Nanoscience and Nanotechnology (ICN2)

17. CSIC and BIST

18. Campus UAB

19. Bellaterra

Abstract

Fabrication of sub-10 nm topographical guiding patterns, block copolymer directed self-assembly, thorough morphology analysis and free energy modelling.

Funder

Ministerio de Ciencia e Innovación

European Commission

Generalitat de Catalunya

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,Industrial and Manufacturing Engineering,Process Chemistry and Technology,Energy Engineering and Power Technology,Biomedical Engineering,Chemical Engineering (miscellaneous),Chemistry (miscellaneous)

Link

http://pubs.rsc.org/en/content/articlepdf/2019/ME/C8ME00046H

Reference52 articles.

1. Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates

2. Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly

3. A Hybrid Chemo-/Grapho-Epitaxial Alignment Strategy for Defect Reduction in Sub-10 nm Directed Self-Assembly of Silicon-Containing Block Copolymers

4. Directed Self-Assembly and Pattern Transfer of Five Nanometer Block Copolymer Lamellae

5. Graphoepitaxy of Spherical Domain Block Copolymer Films

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