Atomic layer deposition-based tuning of the pore size in mesoporous thin films studied by in situ grazing incidence small angle X-ray scattering-Reference-Cited by-同舟云学术

Atomic layer deposition-based tuning of the pore size in mesoporous thin films studied by in situ grazing incidence small angle X-ray scattering

Published:2014-10-13 Issue:24 Volume:6 Page:14991-14998
ISSN:2040-3364
Container-title:Nanoscale
language:en
Short-container-title:Nanoscale

Author:

Dendooven Jolien,Devloo-Casier Kilian,Ide Matthias,Grandfield Kathryn,Kurttepeli Mert,Ludwig Karl F.,Bals Sara,Van Der Voort Pascal,Detavernier Christophe

Funder

Universiteit Gent

Fonds Wetenschappelijk Onderzoek

European Research Council

Brookhaven National Laboratory, Office of Science

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

Link

http://pubs.rsc.org/en/content/articlepdf/2014/NR/C4NR05049E

Reference43 articles.

1. Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process

2. Tuning the Pore Size of Ink-Bottle Mesopores by Atomic Layer Deposition

3. Tailoring nanoporous materials by atomic layer deposition

4. Oxidative dehydrogenation of cyclohexane over alumina-supported vanadium oxide nanoliths

5. Cleavage of the C–O–C bond on size-selected subnanometer cobalt catalysts and on ALD-cobalt coated nanoporous membranes

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