SnO deposition <i>via</i> water based ALD employing tin(<scp>ii</scp>) formamidinate: precursor characterization and process development-Reference-Cited by-同舟云学术

SnO deposition via water based ALD employing tin(ii) formamidinate: precursor characterization and process development

Author:

Huster Niklas¹^ORCID,Ghiyasi Ramin²,Zanders David¹^ORCID,Rogalla Detlef³,Karppinen Maarit²^ORCID,Devi Anjana¹^ORCID

Affiliation:

1. Inorganic Materials Chemistry, Faculty of Chemistry and Biochemistry, Ruhr-University Bochum, 44801 Bochum, Germany

2. Department of Chemistry and Materials Science, Aalto University, FI-00076 Espoo, Finland

3. RUBION, Ruhr University Bochum, 44801 Bochum, Germany

Abstract

We report a new water-based thermal ALD process for the deposition of SnO using a liquid formamidine based tin(ii) precursor.

Funder

Deutsche Forschungsgemeinschaft

H2020 Marie Skłodowska-Curie Actions

Bundesministerium für Bildung und Forschung

Publisher

Royal Society of Chemistry (RSC)

Subject

Inorganic Chemistry

Link

Reference60 articles.

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