Atomic surface of quartz glass induced by photocatalytic green chemical mechanical polishing using the developed SiO2@TiO2 core–shell slurry

Author:

Fan Yuanhang1,Zhang Zhenyu1ORCID,Yu Jiaxin2,Deng Xingqiao3,Shi Chunjing4,Zhou Hongxiu5,Meng Fanning4,Feng Junyuan4

Affiliation:

1. State Key Laboratory of High-performance Precision Manufacturing, Dalian University of Technology, Dalian 116024, China

2. School of Manufacturing Science and Engineering, Southwest University of Science and Technology, Mianyang 621010, China

3. School of Mechanical and Electrical Engineering, Chengdu University of Technology, Chengdu 610059, China

4. School of Mechanical Engineering, Hangzhou Dianzi University, Hangzhou 310018, China

5. School of Energy and Power Engineering, Dalian University of Technology, Dalian 116024, China

Abstract

The material removal mechanism for polishing quartz glasses using SiO2@TiO2 composite abrasives under photocatalytic conditions.

Funder

National Key Research and Development Program of China

National Natural Science Foundation of China

Publisher

Royal Society of Chemistry (RSC)

Subject

General Engineering,General Materials Science,General Chemistry,Atomic and Molecular Physics, and Optics,Bioengineering

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