Wafer-scale detachable monocrystalline germanium nanomembranes for the growth of III–V materials and substrate reuse-Reference-Cited by-同舟云学术

Wafer-scale detachable monocrystalline germanium nanomembranes for the growth of III–V materials and substrate reuse

Published:2023 Issue:18 Volume:5 Page:4696-4702
ISSN:2516-0230
Container-title:Nanoscale Advances
language:en
Short-container-title:Nanoscale Adv.

Author:

Paupy Nicolas¹²^ORCID,Oulad Elhmaidi Zakaria¹²,Chapotot Alexandre¹²,Hanuš Tadeáš¹²,Arias-Zapata Javier¹²^ORCID,Ilahi Bouraoui¹²^ORCID,Heintz Alexandre¹²,Poungoué Mbeunmi Alex Brice¹²,Arvinte Roxana¹²,Aziziyan Mohammad Reza¹²^ORCID,Daniel Valentin¹²,Hamon Gwenaëlle¹²,Chrétien Jérémie¹²,Zouaghi Firas¹²,Ayari Ahmed¹²,Mouchel Laurie¹²,Henriques Jonathan¹²,Demoulin Loïc¹²,Diallo Thierno Mamoudou¹²,Provost Philippe-Olivier¹²,Pelletier Hubert¹²,Volatier Maïté¹²,Kurstjens Rufi³,Cho Jinyoun³,Courtois Guillaume³,Dessein Kristof³,Arcand Sébastien⁴,Dubuc Christian⁴,Jaouad Abdelatif¹²,Quaegebeur Nicolas⁵,Gosselin Ryan⁶,Machon Denis²⁷^ORCID,Arès Richard¹²^ORCID,Darnon Maxime¹²^ORCID,Boucherif Abderraouf¹²

Affiliation:

1. Institut Interdisciplinaire d’Innovation Technologique (3IT), Université de Sherbrooke, 3000 Boulevard de l’Université, Sherbrooke, J1K 0A5, QC, Canada

2. Laboratoire Nanotechnologies Nanosystèmes (LN2) – CNRS IRL-3463, Université de Sherbrooke, 3000 Boulevard Université, Sherbrooke, Québec J1K OA5, Canada

3. Umicore Electro-Optic Materials, Watertorenstraat 33, 2250, Olen, Belgium

4. Saint-Augustin Canada Electric Inc. 75 rue d'Anvers, Saint-Augustin, G3A 1S5, QC, Canada

5. Department of Mechanical Engineering, Université de Sherbrooke, 2500 Boulevard de l’Université, Sherbrooke, J1K 2R1 QC, Canada

6. Department of Chemical and Biotechnological Engineering, Université de Sherbrooke, 2500 Boulevard de l’Université, Sherbrooke, J1K OA5, QC, Canada

7. Institut Lumière Matière, UMR5306 Université Lyon 1-CNRS, Université de Lyon F-69622 Villeurbanne cedex, France

Abstract

The Porous germanium Efficient Epitaxial LayEr Release (PEELER) process is introduced allowing the fabrication of wafer scale detachable monocrystalline Ge nanomembranes compatible with III–V material growth on porous Ge and substrate reuse.

Funder

Natural Sciences and Engineering Research Council of Canada

Mitacs

Fonds de recherche du Québec – Nature et technologies

Publisher

Royal Society of Chemistry (RSC)

Subject

General Engineering,General Materials Science,General Chemistry,Atomic and Molecular Physics, and Optics,Bioengineering

Link

http://pubs.rsc.org/en/content/articlepdf/2023/NA/D3NA00053B

Reference47 articles.

1. Synthesis, assembly and applications of semiconductor nanomembranes