Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure-Reference-Cited by-同舟云学术

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Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure

Published:2014 Issue:36 Volume:2 Page:7570-7574
ISSN:2050-7526
Container-title:J. Mater. Chem. C
language:en
Short-container-title:J. Mater. Chem. C

Author:

Zhang Yijun¹²³⁴,Ren Wei¹²³⁴,Jiang Zhuangde⁵³⁴,Yang Shuming⁵³⁴,Jing Weixuan⁵³⁴,Shi Peng¹²³⁴,Wu Xiaoqing¹²³⁴,Ye Zuo-Guang¹²³⁴⁶

Affiliation:

1. Electronic Materials Research Laboratory

2. Key Laboratory of the Ministry of Education & International Center for Dielectric Research

3. Xi'an Jiaotong University

4. Xi'an 710049, China

5. State Key Laboratory for Manufacturing Systems Engineering

6. Department of Chemistry and 4D LABS

Abstract

Atomic-resolution image of a graphene sheet synthesized by remote plasma-enhanced atomic layer deposition at low temperatures.

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2014/TC/C4TC00849A

Reference36 articles.

1. Fine Structure Constant Defines Visual Transparency of Graphene

2. Graphene at the Edge: Stability and Dynamics

3. Electric Field Effect in Atomically Thin Carbon Films

4. Controlling the Electronic Structure of Bilayer Graphene

5. Electromechanical Resonators from Graphene Sheets

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