Photolithography-assisted precise patterning of nanocracks for ultrasensitive strain sensors-Reference-Cited by-同舟云学术

Photolithography-assisted precise patterning of nanocracks for ultrasensitive strain sensors

Published:2021 Issue:7 Volume:9 Page:4262-4272
ISSN:2050-7488
Container-title:Journal of Materials Chemistry A
language:en
Short-container-title:J. Mater. Chem. A

Author:

Liu Junshan¹²³⁴⁵^ORCID,Guo Hongji¹²³⁴,Li Ming⁶⁷²³⁴,Zhang Chi¹²³⁴^ORCID,Chu Yongzhi¹²³⁴,Che Lixuan⁶⁷²³⁴,Zhang Zhihao¹²³⁴,Li Rui⁶⁷²³⁴,Sun Jining¹²³⁴,Lu Yao⁸⁹¹⁰¹¹¹²^ORCID

Affiliation:

1. Key Laboratory for Micro/Nano Technology and System of Liaoning Province

2. Dalian University of Technology

3. Dalian

4. China

5. Key Laboratory for Precision and Non-traditional Machining Technology of Ministry of Education

6. State Key Laboratory of Structural Analysis for Industrial Equipment

7. Department of Engineering Mechanics

8. Department of Chemistry

9. School of Biological and Chemical Sciences

10. Queen Mary University of London

11. London E1 4NS

12. UK

Abstract

A photolithography-assisted nanocrack patterning method is reported to precisely define the nanocrack pattern in metal films. This method is used to fabricate an ultrasensitive strain sensor with a gauge factor of ∼20 000 in 0–1.2% strain range.

Funder

National Natural Science Foundation of China

Royal Society

National Basic Research Program of China

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science,Renewable Energy, Sustainability and the Environment,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2021/TA/D0TA11374C

Reference50 articles.

1. Cracks: More Than Just a Clean Break