Direct patterning of highly-conductive graphene@copper composites using copper naphthenate as a resist for graphene device applications-Reference-Cited by-同舟云学术

Direct patterning of highly-conductive graphene@copper composites using copper naphthenate as a resist for graphene device applications

Published:2017 Issue:43 Volume:9 Page:16755-16763
ISSN:2040-3364
Container-title:Nanoscale
language:en
Short-container-title:Nanoscale

Author:

Bi Kaixi¹²³⁴⁵^ORCID,Xiang Quan¹²³⁴⁵,Chen Yiqin¹²³⁴⁵,Shi Huimin¹²³⁴⁵,Li Zhiqin¹²³⁴⁵,Lin Jun¹²³⁴⁵,Zhang Yongzhe⁶⁷⁸⁵^ORCID,Wan Qiang¹²³⁴⁵,Zhang Guanhua⁹³⁴⁵,Qin Shiqiao¹⁰¹¹¹²⁵,Zhang Xueao¹⁰¹¹¹²⁵,Duan Huigao⁹³⁴⁵

Affiliation:

1. School of Physics and Electronics

2. State Key Laboratory of Advanced Design and Manufacturing for Vehicle Body

3. Hunan University

4. Changsha 410082

5. China

6. College of Materials Science and Engineering

7. Beijing University of Technology

8. Beijing 100124

9. College of Mechanical and Vehicle Engineering

10. College of Science

11. National University of Defense Technology

12. Changsha 410073

Abstract

We report an electron-beam lithography process to directly fabricate graphene@copper composite patterns without involving metal deposition, lift-off and etching processes.

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

Link

http://pubs.rsc.org/en/content/articlepdf/2017/NR/C7NR05779B

Reference46 articles.

1. Three-Dimensional Printing of Highly Conductive Carbon Nanotube Microarchitectures with Fluid Ink

2. An Electrical Rectifier Based on Au Nanoparticle Array Fabricated Using Direct-Write Electron Beam Lithography

3. In-Plane Patterning of Aggregated Nanoparticle Layers

4. Circuit Fabrication at 17 nm Half-Pitch by Nanoimprint Lithography

5. An Epoxy Photoresist Modified by Luminescent Nanocrystals for the Fabrication of 3D High-Aspect-Ratio Microstructures

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