Circuit Fabrication at 17 nm Half-Pitch by Nanoimprint Lithography-Reference-Cited by-同舟云学术

Circuit Fabrication at 17 nm Half-Pitch by Nanoimprint Lithography

Published:2006-02-04 Issue:3 Volume:6 Page:351-354
ISSN:1530-6984
Container-title:Nano Letters
language:en
Short-container-title:Nano Lett.

Author:

Jung Gun-Young¹,Johnston-Halperin Ezekiel¹,Wu Wei¹,Yu Zhaoning¹,Wang Shih-Yuan¹,Tong William M.¹,Li Zhiyong¹,Green Jonathan E.¹,Sheriff Bonnie A.¹,Boukai Akram¹,Bunimovich Yuri¹,Heath James R.¹,Williams R. Stanley¹

Affiliation:

1. Hewlett-Packard Laboratories, 1501 Page Mill Road, Palo Alto, California 94304, Division of Chemistry and Chemical Engineering, California Institute of Technology, Pasadena, California 91125, and Advanced Materials & Processes Labs, Technology Development Operations, Hewlett-Packard Company, 1000 Circle Boulevard, Corvallis, Oregon 97330

Publisher

American Chemical Society (ACS)

Subject

Mechanical Engineering,Condensed Matter Physics,General Materials Science,General Chemistry,Bioengineering

Link

https://pubs.acs.org/doi/pdf/10.1021/nl052110f

Reference18 articles.

1. A Defect-Tolerant Computer Architecture: Opportunities for Nanotechnology

2. Nanoscale molecular-switch crossbar circuits

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