Ultra low dielectric, self-cleansing and highly oleophobic POSS-PFCP aryl ether polymer composites-Reference-Cited by-同舟云学术

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Ultra low dielectric, self-cleansing and highly oleophobic POSS-PFCP aryl ether polymer composites

Published:2013 Issue:43 Volume:1 Page:7222
ISSN:2050-7526
Container-title:Journal of Materials Chemistry C
language:en
Short-container-title:J. Mater. Chem. C

Author:

Sharma Babloo,Verma Rajneesh,Baur Cary,Bykova Julia,Mabry Joseph M.,Smith Dennis W.

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2013/TC/C3TC31161A

Reference73 articles.

1. Development of a Low-Dielectric-Constant Polymer for the Fabrication of Integrated Circuit Interconnect

2. Low Dielectric Constant Materials for ULSI Interconnects

3. New organosoluble polyimides with low dielectric constants derived from bis[4-(2-trifluoromethyl-4-aminophenoxy)phenyl] diphenylmethylene

4. Fluorinated high-performance polymers: Poly(arylene ether)s and aromatic polyimides containing trifluoromethyl groups

5. Low-k Interlayer Dielectric Materials: Synthesis and Properties of Alkoxy-Functional Silsesquioxanes

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