Low-k Interlayer Dielectric Materials: Synthesis and Properties of Alkoxy-Functional Silsesquioxanes-Reference-Cited by-同舟云学术

Low-k Interlayer Dielectric Materials: Synthesis and Properties of Alkoxy-Functional Silsesquioxanes

Published:2005-04-15 Issue:10 Volume:17 Page:2520-2529
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Su Kai¹,Bujalski Duane R.¹,Eguchi Katsuya¹,Gordon Glenn V.¹,Ou Duan-Li¹,Chevalier Pierre¹,Hu Sanlin¹,Boisvert Ronald P.¹

Affiliation:

1. Dow Corning Corporation, Midland, Michigan 48686-0995

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm048993d

Reference48 articles.

1. Bohr, M. T. InProceedings of the 1995 IEEE International ElectronicDevice Meeting, Washington,DC, Dec. 10−13; IEEE: Piscataway, NJ, 1995; pp 241−442.

2. Low dielectric constant materials for microelectronics

3. Characterization of Transparent Conducting Oxides

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