The effect of polymer modification on microwave digestion efficiency, thermal stability and plasma etching resistance for the photoresist-Reference-Cited by-同舟云学术

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The effect of polymer modification on microwave digestion efficiency, thermal stability and plasma etching resistance for the photoresist

Published:2000 Issue:6 Volume:15 Page:715-720
ISSN:0267-9477
Container-title:Journal of Analytical Atomic Spectrometry
language:
Short-container-title:J. Anal. At. Spectrom.

Author:

Ko Fu-Hsiang,Lu June-Kuen,Chu Tieh-Chi,Chou Cheng-Tung,Hsiao Li-Tung,Lin Horng-Chih

Publisher

Royal Society of Chemistry (RSC)

Subject

Spectroscopy,Analytical Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2000/JA/A908814H

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Array-type microchip sampling to determine trace metal in photoresist used in semiconductor manufacturing process;Journal of Analytical Atomic Spectrometry;2010

2. Combining electrothermal vaporization inductively coupled plasma mass spectrometry with in situ TMAH thermochemolysis for the direct determination of trace impurities in a polymer-based photoresist;Journal of Analytical Atomic Spectrometry;2006

3. Microwave-assisted vapor phase dissolution of photoresist and silicon oxide based slurry samples for the determination of trace impurities by high resolution ICP-MS;Journal of Analytical Atomic Spectrometry;2005

4. Probing the microwave degradation mechanism of phenol-containing polymeric compounds by sample pretreatment and GC–MS analysis;Analytica Chimica Acta;2004-11

5. Evaluation of closed-vessel microwave digestion method for the determination of trace impurities in polymer-based photoresist by inductively coupled plasma mass spectrometry;Microchemical Journal;2004-10

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