Evaluation of closed-vessel microwave digestion method for the determination of trace impurities in polymer-based photoresist by inductively coupled plasma mass spectrometry-Reference-Cited by-同舟云学术

Evaluation of closed-vessel microwave digestion method for the determination of trace impurities in polymer-based photoresist by inductively coupled plasma mass spectrometry

Published:2004-10 Issue:2 Volume:78 Page:163-166
ISSN:0026-265X
Container-title:Microchemical Journal
language:en
Short-container-title:Microchemical Journal

Author:

Sun Yun-Chang,Ko Chu-Jung

Publisher

Elsevier BV

Subject

Spectroscopy,Analytical Chemistry

Reference13 articles.

1. Impact of Trace Metals in Litho Chemicals

2. Metallic contamination assessment of Silicon wafers

3. Characterization and Modeling of Out‐Diffusion of Manganese and Zinc Impurities from Deep Ultraviolet Photoresist

4. J. Rakahahi, K. Yono, Aligent Technologies, Publication Number 5988-7100EN.

5. Determination of Trace Metals in Positive Photoresists

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