Chemical and structural investigation of zinc-oxo cluster photoresists for DUV lithography-Reference-Cited by-同舟云学术

Chemical and structural investigation of zinc-oxo cluster photoresists for DUV lithography

Author:

Yeh Chun-Cheng¹²³⁴⁵,Liu Hung-Chuan⁶⁷⁸⁹,Heni Wajdi¹²³⁴⁵,Berling Dominique¹²³⁴⁵^ORCID,Zan Hsiao-Wen⁶⁷⁸⁹,Soppera Olivier¹²³⁴⁵^ORCID

Affiliation:

1. Institut de Science des Matériaux de Mulhouse (IS2M)

2. CNRS – UMR 7361

3. Université de Haute Alsace

4. Mulhouse

5. France

6. Department of Photonics and Institute of Electro-Optical Engineering

7. National Chiao Tung University

8. Hsinchu

9. Republic of China

Abstract

A Zn oxo-cluster photoresist was synthesized and the impact of chemical and physicochemical parameters on photopatterning was investigated.

Funder

Ministry of Science and Technology

Agence Nationale de la Recherche

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry

Link

Reference36 articles.

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