Superior wear resistance and low friction in hybrid ultrathin silicon nitride/carbon films: synergy of the interfacial chemistry and carbon microstructure-Reference-Cited by-同舟云学术

Superior wear resistance and low friction in hybrid ultrathin silicon nitride/carbon films: synergy of the interfacial chemistry and carbon microstructure

Published:2017 Issue:39 Volume:9 Page:14937-14951
ISSN:2040-3364
Container-title:Nanoscale
language:en
Short-container-title:Nanoscale

Author:

Yeo Reuben J.¹²³,Dwivedi Neeraj¹²³,Zhang Lu⁴⁵⁶⁷,Zhang Zheng⁸⁵⁶⁹,Lim Christina Y. H.¹⁰²¹¹,Tripathy Sudhiranjan⁸⁵⁶⁹,Bhatia Charanjit S.¹²³^ORCID

Affiliation:

1. Department of Electrical and Computer Engineering

2. National University of Singapore

3. Singapore 117583

4. Institute of Microelectronics

5. A*STAR (Agency for Science

6. Technology and Research)

7. Singapore 117685

8. Institute of Materials Research and Engineering

9. Singapore 138634

10. Department of Mechanical Engineering

11. Singapore 117575

Abstract

A sub-10 nm hybrid SiN_x/C film demonstrated remarkable wear durability under aggressive wear due to an enhanced interfacial chemistry and carbon microstructure.

Funder

National Research Foundation Singapore

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

Link

http://pubs.rsc.org/en/content/articlepdf/2017/NR/C7NR03737F

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