Combining single source chemical vapour deposition precursors to explore the phase space of titanium oxynitride thin films
Author:
Affiliation:
1. Department of Chemistry
2. University of Southampton
3. Southampton
4. UK
5. School of Chemistry
6. University of Leeds
7. Leeds
Abstract
Combining single-source precursors in aerosol assisted CVD allows control of the composition of mixed anion titanium oxynitride thin films.
Funder
Engineering and Physical Sciences Research Council
Leverhulme Trust
Publisher
Royal Society of Chemistry (RSC)
Subject
Inorganic Chemistry
Link
http://pubs.rsc.org/en/content/articlepdf/2018/DT/C7DT04694D
Reference36 articles.
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3. Chemical vapour deposition of coatings
4. Solution based CVD of main group materials
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