Mixed-ligand zinc-oxoclusters: efficient chemistry for high resolution nanolithography
Author:
Affiliation:
1. Advanced Research Center for Nanolithography
2. Amsterdam 1098XG
3. The Netherlands
4. Paul Scherrer Institute
5. Villigen 5232
6. Switzerland
Abstract
The combined reactivity of methacrylate and trifluoroacetate ligands make zinc-oxoclusters pattern 22–50 nm lines with high sensitivity by EUV Lithography.
Funder
Seventh Framework Programme
Publisher
Royal Society of Chemistry (RSC)
Subject
Materials Chemistry,General Chemistry
Link
http://pubs.rsc.org/en/content/articlepdf/2020/TC/D0TC03597A
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