An embedded neutral layer for advanced surface affinity control in grapho-epitaxy directed self-assembly-Reference-Cited by-同舟云学术

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An embedded neutral layer for advanced surface affinity control in grapho-epitaxy directed self-assembly

Published:2018 Issue:23 Volume:10 Page:10900-10910
ISSN:2040-3364
Container-title:Nanoscale
language:en
Short-container-title:Nanoscale

Author:

Delachat Florian¹²³^ORCID,Gharbi Ahmed¹²³,Pimenta-Barros Patricia¹²³,Fouquet Antoine¹²³,Claveau Guillaume¹²³,Posseme Nicolas¹²³,Pain Laurent¹²³,Nicolet Célia⁴⁵³,Navarro Christophe⁴⁵³,Cayrefourcq Ian⁴⁵³,Tiron Raluca¹²³

Affiliation:

1. CEA-LETI MINATEC

2. Cedex 9

3. France

4. ARKEMA FRANCE

5. BP34-64170 Lacq

Abstract

This work developed an innovative process for grapho-epitaxy DSA which enables independent control of the template surface affinities.

Funder

Horizon 2020 Framework Programme

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

Link

http://pubs.rsc.org/en/content/articlepdf/2018/NR/C8NR00123E

Reference39 articles.

1. Block Copolymers—Designer Soft Materials

2. Wide-range directed self-assembly lithography enabling wider range of applicable pattern size for both hexagonal multi-hole and line/space

3. Laser Writing Block Copolymer Self-Assembly on Graphene Light-Absorbing Layer

4. Flash Light Millisecond Self-Assembly of High χ Block Copolymers for Wafer-Scale Sub-10 nm Nanopatterning

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Thermodynamics and ordering kinetics in asymmetric PS-b-PMMA block copolymer thin films;Soft Matter;2020

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