Flash Light Millisecond Self-Assembly of High χ Block Copolymers for Wafer-Scale Sub-10 nm Nanopatterning-Reference-Cited by-同舟云学术

Flash Light Millisecond Self-Assembly of High χ Block Copolymers for Wafer-Scale Sub-10 nm Nanopatterning

Published:2017-06-21 Issue:32 Volume:29 Page:1700595
ISSN:0935-9648
Container-title:Advanced Materials
language:en
Short-container-title:Adv. Mater.

Author:

Jin Hyeong Min¹,Park Dae Yong²,Jeong Seong-Jun³,Lee Gil Yong¹,Kim Ju Young¹,Mun Jeong Ho¹,Cha Seung Keun¹,Lim Joonwon¹,Kim Jun Soo¹,Kim Kwang Ho⁴,Lee Keon Jae²,Kim Sang Ouk¹

Affiliation:

1. National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly; Department of Materials Science and Engineering; KAIST; Daejeon 34141 Republic of Korea

2. Department of Materials Science and Engineering; KAIST; Daejeon 34141 Republic of Korea

3. Device Laboratory; Device & System Research Center; Samsung Advanced Institute and Technology; Suwon 16678 Republic of Korea

4. Department of Materials Science and Engineering; Pusan National University; Pusan 46241 Republic of Korea

Funder

National Creative Research Initiative

Grobal Frontier Hybrid Interface Materials

National Research Foundation of Korea

Ministry of Science, ICT and Future Planning

Creative Materials Discovery Program

Publisher

Wiley

Subject